Pre-alignment marking and inspection to improve mask...

Details Pre-alignment marking and inspection to improve mask... Pre-alignment marking and inspection to improve mask...

2011-04-19

2011-04-19

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07927766

ABSTRACT:
A method includes determining defect types and defect locations on a mask blank and storing the defect types and the defect locations. The method further includes generating at least one alignment mark on the mask blank and selecting a mask pattern for the mask blank based on the defect types and the defect locations. Additionally, the method includes determining a positioning of the mask pattern on the mask blank, aligning a mask pattern generator with the mask blank in accordance with the positioning using the at least one alignment mark and forming the mask pattern on the mask blank using the mask pattern generator.

REFERENCES:
patent: 3874916 (1975-04-01), Livesay et al.
patent: 6765673 (2004-07-01), Higashikawa
patent: 2007/0106416 (2007-05-01), Griffiths et al.
Hector, S. et al., “Shifting pattern data to avoid mask blank defects”, Nov. 20, 2001, IP.com Prior Art Database, www.ip.com.

Affiliated with

Also associated with

Rating

Pre-alignment marking and inspection to improve mask... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pre-alignment marking and inspection to improve mask..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pre-alignment marking and inspection to improve mask... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2706121