Powered load lock electrode/substrate assembly including robot a

Details Powered load lock electrode/substrate assembly including robot a Powered load lock electrode/substrate assembly including robot a

1984-10-22

1987-04-14

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

1566591, H01L 21306, B44C 122, C03C 1500, C23F 102

Patent

active

046576185

ABSTRACT:
An electrode and substrate assembly for a plasma reactor allows high power plasma processing with low frequency excitation. The electrode sub-assembly is contained in a chamber which is used for pre-treatment such as de-scumming photoresist or for post-etch resist stripping and passivation. A post-etch treatment is essential in plasma aluminum etching.

REFERENCES:
patent: 3757733 (1973-09-01), Reinberg
patent: 4313783 (1982-02-01), Davies et al.
patent: 4318767 (1982-03-01), Hijikata et al.
patent: 4341582 (1982-07-01), Kohman et al.
patent: 4422896 (1983-12-01), Chass et al.
patent: 4526670 (1985-07-01), Hajj

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