Power semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Wire contact – lead – or bond

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Details

257584, 257771, H01L 2348, H01L 2943

Patent

active

055392440

ABSTRACT:
A first power semiconductor device with a semiconductor base to which an emitter wire electrode is connected through an emitter bonding pad and a gate wire electrode is connected through a gate bonding pad, wherein the gate bonding pad comprises a silicon oxide film, a silicon crystal layer and a gate wiring electrode made of aluminum containing silicon which are successively formed on the semiconductor base, and the gate wire electrode is connected to the gate wiring electrode. A second power semiconductor device wherein the emitter bonding pad is an emitter wiring electrode made of aluminum containing silicon which is directly formed on the semiconductor base, and the emitter wire electrode is bonded to the emitter wiring electrode.

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patent: 4754318 (1988-06-01), Momose et al.
patent: 4761386 (1988-08-01), Buynoski
patent: 4888306 (1989-12-01), Komatsu et al.
patent: 5160985 (1992-11-01), Akiyama
Koyama et al., "A New Bond Failure Wire Crater In Surface Mount Device", IEEE/IRPS, 1988, pp. 59-63.
Koch et al., "A Bond Failure Mechanism", IEEE/IRPS, 1986, pp. 55-60.
Johnson et al., "Silicon Percipitate Nodule-Induced Failures of MOSFETS", ISTFA, 1991, pp. 161-165.

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