Power distribution for multiple electrode plasma systems using q

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

422907, 118723R, 118723E, B01J 1908

Patent

active

057335117

ABSTRACT:
A multiple electrode plasma reactor power splitter and delivery system to provide balanced power to a plurality of powered electrodes by utilizing the properties of quarter wave length transmission lines. Each electrode is supplied power by a separate (2N+1).lambda./4 wavelength cable, where N=0,1,2 . . . , connected to a common point at a load matching network's output. The impedance transformation properties of these lines are also employed to convert the plasma load to one that is more efficiently matched into by a standard network. Also disclosed is a technique of splitting a single large active electrode into smaller active electrodes powered by the above distribution scheme in order to achieve maximum uniformity of the reactive plasma throughout the working volume.

REFERENCES:
patent: 3347772 (1967-10-01), Laegreid et al.
patent: 3471396 (1969-10-01), Davidse
patent: 3525680 (1970-08-01), Davidse et al.
patent: 3616405 (1971-10-01), Beaudry
patent: 3653766 (1972-04-01), Walters et al.
patent: 3767551 (1973-10-01), Lang, Jr. et al.
patent: 4129839 (1978-12-01), Galani et al.
patent: 4254386 (1981-03-01), Nemit et al.
patent: 4282077 (1981-08-01), Reavill
patent: 4310814 (1982-01-01), Bowman
patent: 4337415 (1982-06-01), Durr
patent: 4351714 (1982-09-01), Kuriyama
patent: 4381965 (1983-05-01), Maher, Jr. et al.
patent: 4482246 (1984-11-01), Meyer et al.
patent: 4609808 (1986-09-01), Bloyet et al.
patent: 4611108 (1986-09-01), Leprince et al.
patent: 4664890 (1987-05-01), Tawada et al.
patent: 4704301 (1987-11-01), Bauer et al.
patent: 4724296 (1988-02-01), Morley
patent: 4887005 (1989-12-01), Rough et al.
patent: 4930035 (1990-05-01), Viana et al.
patent: 5006760 (1991-04-01), Drake, Jr.
patent: 5077499 (1991-12-01), Oku
patent: 5111024 (1992-05-01), Patron et al.
patent: 5111111 (1992-05-01), Stevens et al.
patent: 5128602 (1992-07-01), Carter
patent: 5140223 (1992-08-01), Gesche et al.
patent: 5180949 (1993-01-01), Durr
patent: 5210466 (1993-05-01), Collins et al.
patent: 5262610 (1993-11-01), Huang et al.
patent: 5433813 (1995-07-01), Kuwabara
patent: 5556501 (1996-09-01), Collins et al.
patent: 5565738 (1996-10-01), Samukawa et al.
Technology Topics, "Sputter Etch Using RF Rotary Planetary Tooling".
"Electrical Characterization of Radio-Frequency Sputtering Gas Discharge", J.S. Logan, N.M. Mazza & P.D. Davidse, Journal of Vacuum Science & Technology (US), vol. 6, No. 1, pp. 120-123.
"Automatic Impedance Matching System for RF Sputtering", N.M. Mazza, IBM Journal Research & Development (US), vol. 11, No. 2 (2 pages), Mar. 1970.
"RF Biasing Through Capacitive Collector to Target Coupling in RF Diode Sputtering", O. Christensen & P. Jensen, Journal of Physics Part E (GB), vol. 5, No. 1 (5 pages), Jan. 1972.
"Ultra-Stable System for RF Sputtering with RF-Induced Substrate Bias", J.L. Vossen & J.J. O'Neill, Jr., Journal of Vacuum Science & Technology (US), vol. 12, No. 5, pp. 1052-1057, Sep./Oct. 1975.
"Impedance Matching Circuit for RF Sputtering Systems", W.B. Pennebaker, IBM Technical Disclosure Bulletin (US), vol. 19, No. 7, pp. 2809-2810, Dec. 1976.
"Experimental and Design Information for Calculating Impedance Matching Networks for Use in RF Sputtering and Plasma Chemistry", H. Norstrom, Vacuum (GB), vol. 29, No. 10, pp. 341-350, (Received for Publication Jun. 8, 1979)
"A.A.R.L. Antenna Book", American Radio Relay League, Inc., 1960, pp. 67-80, 100-113.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Power distribution for multiple electrode plasma systems using q does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Power distribution for multiple electrode plasma systems using q, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Power distribution for multiple electrode plasma systems using q will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-48826

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.