Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate
2011-04-19
2011-04-19
Lund, Jeffrie R (Department: 1716)
Coating apparatus
Gas or vapor deposition
Work support
C118S715000, C118S728000, C118S7230ER, C118S712000, C156S345470, C156S345510, C156S345540
Reexamination Certificate
active
07927425
ABSTRACT:
A power-delivery mechanism is provided in the present invention, which utilizes an element with airtight and flexible characteristics coupled to a power-generating unit so as to generate a motion in a specific direction. Besides, an apparatus of plasma -enhanced chemical vapor deposition (PECVD) is also provided in the present invention, which comprises the power-delivery mechanism to load/unload a workpiece onto a stage for processing automatically. Meanwhile, the present invention also provides a height-adjusting unit and a position-indicating unit allowing the operator to adjust the distance between an upper electrode and a lower electrode of the PECVD so that the operator is capable of monitoring and adjusting the distance easily between the upper electrode and the lower electrode outside the chamber of the PECVD.
REFERENCES:
patent: 5558717 (1996-09-01), Zhao et al.
patent: 5772773 (1998-06-01), Wytman
patent: 5853607 (1998-12-01), Zhao et al.
patent: 5911834 (1999-06-01), Fairbairn et al.
patent: 6103304 (2000-08-01), Mizuno
patent: 6120609 (2000-09-01), Selyutin et al.
patent: 6142096 (2000-11-01), Sakai et al.
patent: 6676761 (2004-01-01), Shang et al.
patent: 6767176 (2004-07-01), Yudovsky et al.
patent: 7160392 (2007-01-01), Shang et al.
patent: 7189313 (2007-03-01), Lubomirsky
patent: 7857947 (2010-12-01), Ritchie et al.
patent: 2002/0050246 (2002-05-01), Parkhe
patent: 2002/0174950 (2002-11-01), Park
patent: 2003/0000775 (2003-01-01), Yudovsky et al.
patent: 2003/0209443 (2003-11-01), Lubomirsky
patent: 2004/0020601 (2004-02-01), Zhao et al.
patent: 2004/0026041 (2004-02-01), Yamagishi
patent: 2004/0058067 (2004-03-01), Law et al.
patent: 2004/0089239 (2004-05-01), Shang et al.
patent: 2004/0129211 (2004-07-01), Blonigan et al.
patent: 2004/0177813 (2004-09-01), Schieve et al.
patent: 2004/0221808 (2004-11-01), Kawano
patent: 2005/0217586 (2005-10-01), Lubomirsky et al.
patent: 2006/0175011 (2006-08-01), Shinriki et al.
patent: 2006/0238953 (2006-10-01), Hanawa et al.
patent: 2006/0240542 (2006-10-01), Schieve et al.
patent: 2006/0281310 (2006-12-01), Smith et al.
patent: 2007/0031609 (2007-02-01), Kumar et al.
patent: 2007/0089672 (2007-04-01), Shimamura et al.
patent: 2007/0218702 (2007-09-01), Shimizu et al.
patent: 2007/0240646 (2007-10-01), Jun
patent: 2008/0282982 (2008-11-01), White et al.
patent: 2008/0295771 (2008-12-01), Chiang et al.
patent: 2010/0311203 (2010-12-01), Borden et al.
patent: 11302829 (1999-11-01), None
patent: 200556994 (2005-03-01), None
patent: 2007-36070 (2007-02-01), None
Chen Kuan-Chou
Chiang Yuan-Yuan
Tung Fu-Ching
Industrial Technology Research Institute
King Justin
Lund Jeffrie R
WPAT. P.C.
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