Powder metallurgy sputtering targets and methods of...

Details Powder metallurgy sputtering targets and methods of... Powder metallurgy sputtering targets and methods of...

2006-06-27

2006-06-27

Jenkins, Daniel (Department: 1742)

Stock material or miscellaneous articles

All metal or with adjacent metals

Having metal particles

C428S559000, C075S244000

Reexamination Certificate

active

07067197

ABSTRACT:
A method of forming a sputtering target and other metal articles having controlled oxygen and nitrogen content levels and the articles so formed are described. The method includes surface-nitriding a deoxidized metal powder and further includes consolidating the powder by a powder metallurgy technique. Preferred metal powders include, but are not limited to, valve metals, including tantalum, niobium, and alloys thereof.

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