Coating processes – Direct application of electrical – magnetic – wave – or... – Electrostatic charge – field – or force utilized
Reexamination Certificate
2007-07-03
2007-07-03
Parker, Fred J. (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Electrostatic charge, field, or force utilized
C427S458000, C118S621000, C118S629000
Reexamination Certificate
active
10493382
ABSTRACT:
In a powder coating apparatus a pulse signal S2of a low voltage generated by a pulse signal generation circuit (7) is boosted to a high voltage by means of a high voltage impression circuit (8), so that it is impressed upon corona electrodes (5). As a result, a corona discharge is intermittently generated from the corona electrodes (5) toward an object to be coated, whereby powder coating material sprayed from a nozzle opening of a gun main body in a forward direction is charged with negative ions developed by the corona discharge, whereafter it is directed toward the object to be coated, and is deposited on a surface of the object.
REFERENCES:
patent: 4011991 (1977-03-01), Masuda
patent: 4745520 (1988-05-01), Hughey
patent: 5506746 (1996-04-01), Seitz
patent: 6227465 (2001-05-01), Kelly
patent: 59-127666 (1984-07-01), None
patent: 6-218546 (1994-08-01), None
patent: 11-60759 (1999-03-01), None
patent: 2001-96201 (2001-04-01), None
patent: 2002-135615 (2002-05-01), None
patent: 2002-173763 (2002-06-01), None
Websters Third international Dictionary, 1981, p. 2080.
Morita Tadao
Murai Hiroki
Nakamura Akira
Yabe Kosei
Nihon Parkerizing Co. Ltd.
Parker Fred J.
Wenderoth , Lind & Ponack, L.L.P.
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