Potassium titanate, method for manufacturing the same,...

Details Potassium titanate, method for manufacturing the same,... Potassium titanate, method for manufacturing the same,...

2011-03-08

2011-03-08

Jagannathan, Vasu (Department: 1764)

Chemistry of inorganic compounds

Oxygen or compound thereof

Metal containing

C423S593100, C423S598000, C428S402000, C523S149000, C524S413000

Reexamination Certificate

active

07901659

ABSTRACT:
Potassium titanate is obtained which has a novel configuration, exhibits excellent wear resistance when incorporated in a friction material and shows an excellent reinforcement performance when incorporated in a resin composition. A manufacturing method of the potassium titanate, a friction material using the potassium titanate and a resin composition using the potassium titanate are also obtained. The potassium titanate is represented by K2TinO(2n+1)(n=4.0-11.0) and has the highest X-ray diffraction intensity peak (26) in the range of 11.0°-13.5° with its half width being not less than 0.5°.

REFERENCES:
patent: 6036938 (2000-03-01), Konnai et al.
patent: 6579619 (2003-06-01), Konnai
patent: 6677041 (2004-01-01), Ogawa et al.
patent: H10-316428 (1998-12-01), None
patent: 2000-256013 (2000-09-01), None
patent: 2000-313620 (2000-11-01), None
patent: 2001-106526 (2001-04-01), None
patent: 2001-253712 (2001-09-01), None
patent: 2003-335519 (2003-11-01), None
patent: 00/66497 (2000-11-01), None
Chinese Office Action issued Nov. 12, 2010, in Chinese Patent Appln. No. 200880007938.9 and English translation thereof.

Affiliated with

Also associated with

Rating

Potassium titanate, method for manufacturing the same,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Potassium titanate, method for manufacturing the same,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Potassium titanate, method for manufacturing the same,... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2678714