Potassium-containing thin film and process for producing the sam

Details Potassium-containing thin film and process for producing the sam Potassium-containing thin film and process for producing the sam

1999-03-10

2000-11-21

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

117948, C30B 2500

Patent

active

061499757

ABSTRACT:
When a potassium-containing substance is formed in to a film using an organic potassium complex as a potassium source by the CVD method, it is prevented that the film formation rate is changed with the lapse of time, and the potassium content in the film thus formed is changed.
As a potassium source for vaporization used for depositing the potassium-containing substance on a substrate by the CVD method, a .beta.-diketone complex of potassium that has been melted by heating to a temperature higher than its melting point and then cooled to be solidified is used.

REFERENCES:
patent: 5258204 (1993-11-01), Wernberg et al.
patent: 5904771 (1999-05-01), Tasaki et al.

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