Potassium-containing thin film and process for producing the sam

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

117948, C30B 2500

Patent

active

061499757

ABSTRACT:
When a potassium-containing substance is formed in to a film using an organic potassium complex as a potassium source by the CVD method, it is prevented that the film formation rate is changed with the lapse of time, and the potassium content in the film thus formed is changed.
As a potassium source for vaporization used for depositing the potassium-containing substance on a substrate by the CVD method, a .beta.-diketone complex of potassium that has been melted by heating to a temperature higher than its melting point and then cooled to be solidified is used.

REFERENCES:
patent: 5258204 (1993-11-01), Wernberg et al.
patent: 5904771 (1999-05-01), Tasaki et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Potassium-containing thin film and process for producing the sam does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Potassium-containing thin film and process for producing the sam, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Potassium-containing thin film and process for producing the sam will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1254522

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.