Postive working multi-level photoresist

Details Postive working multi-level photoresist Postive working multi-level photoresist

1986-10-20

1989-09-05

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Photomechanical dye image prepared

430148, 430156, 430191, 430311, 430312, 430326, 430327, 430328, 430329, 430330, G03F 726

Patent

active

048638277

ABSTRACT:
A process for forming a multi-level positive working photosensitive element. One forms a composition containing an alkali soluble resin, an o-quinonediazide compound and an in-situ generated acid catalyzed crosslinker in a solvent mixture. After coating on a substrate, drying and partially cross-linking the first layer, a second positive working light sensitive layer is applied. Each light sensitive layer is activated by u.v. radiation in different parts of the spectrum. The top layer is imagewise exposed and developed to form a mask. The second layer is flood exposed through this mask and developed. Each development is conducted with an aqueous alkaline solution.

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