Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Patent
1998-02-27
2000-08-08
Utech, Benjamin L.
Semiconductor device manufacturing: process
Chemical etching
Combined with the removal of material by nonchemical means
697745, 697753, 697756, H01L 2100, B08B 304
Patent
active
061001988
ABSTRACT:
Washing a microelectronic substrate with an ozonated solution following planarization and proceeding removal of a native oxide layer through acid etching.
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Wolf, Stanley, Ph.D. and Tauber, Richard N., Ph.D., "Wet Processing: Cleaning, Etching, and Liftoff", Silicone Processing For The VLSI Era, vol. 1, Process Technology, Lattice Press, 15:514-520, 1986.
Barnhart Gunnar A.
Grieger Eric K.
Kennedy Tim J.
Whitney Robert H.
Micro)n Technology, Inc.
Umez-Eronini Lynette T.
Utech Benjamin L.
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