Post CMP precursor treatment

Details Post CMP precursor treatment Post CMP precursor treatment

2006-01-03

2006-01-03

Nhu, David (Department: 2818)

Semiconductor device manufacturing: process

Having organic semiconductive component

C438S692000

Reexamination Certificate

active

06982188

ABSTRACT:
Systems and methods are disclosed for creating smooth surfaces for layers that are employed in memory cells and have previously been subject to a CMP process. The present invention employs various cycles of exposing the post CMP surface to inorganic and organic acids, as well as growing passive layers. The systems and methods may comprise an electroless feature for forming the passive layers.

REFERENCES:
patent: 6773954 (2004-08-01), Subramanian et al.
patent: 6798068 (2004-09-01), Oglesby
patent: 6803267 (2004-10-01), Subramanian et al.
patent: 6825060 (2004-11-01), Lyons et al.
patent: 6836398 (2004-12-01), Subramanian et al.

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