Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-07-26
1993-07-20
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430193, 430285, C03C 156, C03C 160, G03F 7023
Patent
active
052292452
ABSTRACT:
A positively working photosensitive composition is disclosed useful for making positively working lithographic printing plates of exceptional wear, printing and solvent-resistant characteristics. The positively working photosensitive composition essentially contains a .beta.-dicarbonyl group and a quinone diazide group.
REFERENCES:
patent: 3902906 (1975-09-01), Iwama et al.
patent: 4876173 (1989-10-01), Maemoto et al.
patent: 4925768 (1990-05-01), Iwasaki et al.
Lin Dhei-Jhai
Lin Hsien-Kuang
Shieh Jim-Chyuan
Bowers Jr. Charles L.
Huff Mark F.
Industrial Technology Research Institute
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