Positive working thermally stable photoresist composition, artic

Details Positive working thermally stable photoresist composition, artic Positive working thermally stable photoresist composition, artic

1975-07-18

1978-06-06

Bowers, Jr., Charles L.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 351, 96 362, 96 49, 96 75, 96 91D, 96115R, G03C 154, G03C 160, G03C 534

Patent

active

040934616

ABSTRACT:
A positive working, thermally stable photoresist, comprising a light-sensitive orthoquinone diazide or naphthoquinone diazide and a polyamic acid condensation product of an aromatic dianhydride and an aromatic di-primary amine, and a support carrying a layer of said photoresist. After exposure, the image is developed in the layer with an alkaline aqueous developer and is unaffected by heating to 500.degree. C, thus allowing the use of the photoresist layer for plasma and sputter-etching as well as ion implantation.

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patent: 3871930 (1975-03-01), Fish
Kosar, J., "Light-Sensitive Systems," J. Wiley & Sons, 1965, pp. 336-342 and 356.

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