Positive-working resist quinone diazide containing composition a

Details Positive-working resist quinone diazide containing composition a Positive-working resist quinone diazide containing composition a

1981-08-06

1982-12-21

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430192, 430165, 430296, 430326, 430330, G03C 160, G03C 172, G03F 708

Patent

active

043650198

ABSTRACT:
There are disclosed a resist composition and imaging method wherein the development rate of the composition is improved by using a polyhalogenated heterocyclic sensitivity-enhancing agent.

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Massa & Rachford, ACS Polymer Preprint, vol. 17, No. 2, p. 184, (1976).

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