Positive working resist compositions process of exposing, stripp

Details Positive working resist compositions process of exposing, stripp Positive working resist compositions process of exposing, stripp

1991-09-10

1992-09-08

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

Element

430256, 430270, 430271, 430326, G03C 190

Patent

active

051457644

ABSTRACT:
This invention relates to positive working resist compositions having utility in dry film photoresists and to fully aqueous methods for developing and stripping them.

REFERENCES:
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patent: 4951379 (1990-06-01), Brunsvold et al.
"Printed Circuits Handbook", Chapter 6, Clyde F. Coombs, ed., Second Edition, McGraw-Hill, Inc. (1979).
"Photoresist Mat'ls and Processess", Chapter 5, W. S. deForest, McGraw-Hill Book Company (1975).
J. E. Kearns, et al., J. Macromol. Sci.-Chem. A8(4): 673-685 (1974).

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