Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1993-03-04
1994-08-16
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430189, 430191, 430192, 430270, 430271, 430275, 522 59, G03F 7022, G03C 176
Patent
active
053386418
ABSTRACT:
A positive-working radiation-sensitive mixture is disclosed which contains as essential constituents:
REFERENCES:
patent: 3515552 (1970-06-01), Smith
patent: 3536489 (1970-10-01), Smith
patent: 3615455 (1971-10-01), Laridon et al.
patent: 3615630 (1971-10-01), Dietrich
patent: 3686084 (1972-08-01), Rosenkranz
patent: 3779778 (1973-12-01), Smith et al.
patent: 3912606 (1975-10-01), Pacifici et al.
patent: 4101323 (1978-07-01), Buhr et al.
patent: 4189323 (1980-02-01), Buhr
patent: 4212970 (1980-07-01), Iwasaki
patent: 4232106 (1980-11-01), Iwasaki et al.
patent: 4247611 (1981-01-01), Sander et al.
patent: 4248957 (1981-02-01), Sander et al.
patent: 4250247 (1981-02-01), Sander et al.
patent: 4279982 (1981-07-01), Iwasaki et al.
patent: 4311782 (1982-01-01), Buhr et al.
patent: 4343885 (1982-08-01), Reardon, Jr.
patent: 4371606 (1983-02-01), Donges
patent: 4371607 (1983-02-01), Donges
patent: 4491628 (1985-01-01), Ito et al.
patent: 4506003 (1985-03-01), Ruckert et al.
patent: 4506006 (1985-03-01), Ruckert
patent: 4603101 (1986-07-01), Crivello
patent: 4619998 (1986-10-01), Buhr
patent: 4696888 (1987-09-01), Buhr
patent: 4737426 (1988-04-01), Roth
patent: 4786577 (1988-11-01), Aoai et al.
patent: 4806448 (1989-02-01), Roth
patent: 4840867 (1989-06-01), Elsaesser et al.
patent: 5250669 (1993-10-01), Ogawa et al.
patent: 5272036 (1993-12-01), Tani et al.
Willson, "Organic Resist Materials--Theory and Chemistry," Introduction to Microlithography, ACS Symp. Ser., 219: 87, 1983, pp. 87-159.
Crivello, "Possibilities for Photoimaging Using Onium Salts," Polymer Engineering and Science, Dec. 1983, vol. 23, No. 18, pp. 953-956.
Houlihan et al., "An evaluation of nitrobenzyl ester chemistry for chemical amplification resists," SPIE vol. 920 Advances in Resist Technology and Processing V, 1988, pp. 67-74.
Dammel Ralph
Lingnau Juergen
Merrem Hans-Joachim
Pawlowski Georg
Roeschert Horst
Bowers Jr. Charles L.
Chu John S.
Hoechst Aktiengesellschaft
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