Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1996-09-09
1998-07-21
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
4302701, 430905, 430910, 522 31, G03F 7004, G03F 7039
Patent
active
057833540
ABSTRACT:
A positive-working radiation-sensitive mixture essentially consists of
REFERENCES:
patent: 3844787 (1974-10-01), Ulrich et al.
patent: 3915706 (1975-10-01), Limburg et al.
patent: 3923514 (1975-12-01), Marsha
patent: 4678737 (1987-07-01), Scneller et al.
patent: 5116715 (1992-05-01), Roland
patent: 5210003 (1993-05-01), Schaedeli
patent: 5380881 (1995-01-01), Schaedeli
patent: 5478690 (1995-12-01), Kanda et al.
patent: 5670294 (1997-09-01), Piro
Patent Abstracts of Japan, vol. 16, No. 80 (p-1318), Feb. 26, 1992 (English abstract of JP-3267941, Nov. 28, 1991).
Binder Horst
Funhoff Dirk
Schwalm Reinhold
BASF - Aktiengesellschaft
Chu John S.
LandOfFree
Positive-working radiation-sensitive mixture does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Positive-working radiation-sensitive mixture, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive-working radiation-sensitive mixture will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1645485