Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-02-15
1996-06-11
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 4302701, 4302711, G03F 7021
Patent
active
055254535
ABSTRACT:
A novel positive-working radiation-sensitive mixture having a high sensitivity to radiation in a short-wavelength UV region is provided which can be developed in an aqueous alkaline solution, has a stable acid latent image and is used for the production of a semiconductor. The mixture comprises, as indispensable components, a) a binder insoluble in water but soluble in an aqueous alkaline solution, b) a compound having at least one bond cleavable with an acid, c) a compound capable of producing an acid upon radiation, and d.sub.1) a basic ammonium compound or d.sub.2) a basic sulfonium compound.
REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
Dammel Ralph
Endo Hajime
Kinoshita Yoshiaki
Kudo Takanori
Masuda Seiya
Bowers Jr. Charles L.
Hoechst Japan Limited
Young Christopher G.
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