Positive-working radiation-sensitive coating solution and positi

Details Positive-working radiation-sensitive coating solution and positi Positive-working radiation-sensitive coating solution and positi

1986-12-29

1988-08-16

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430166, 430169, 430189, 430192, 430270, 430271, 430275, 430277, 430278, 430279, 430935, G03C 160, G03C 174

Patent

active

047644508

ABSTRACT:
A positive-working radiation-sensitive coating solution is disclosed which contains a radiation-sensitive compound, e.g., a 1,2-naphthoquinone diazide, or a radiation-sensitive combination of compounds, e.g., a compound with at least one C--O--C bond which can be split by acid and a compound which upon radiation forms a strong acid, and at least one organic solvent which comprises a mono-C.sub.1 to C.sub.4 -alkyl ether of 1,2-propanediol. The coating solution is less toxic and results in a better layer leveling than known positive-working photoresist solutions.

REFERENCES:
patent: 3586504 (1971-06-01), Coates et al.
patent: 3634082 (1972-01-01), Christensen
patent: 3640992 (1972-02-01), Sus et al.
patent: 3669662 (1972-06-01), Agnihotri
patent: 3779778 (1973-12-01), Smith et al.
patent: 3868254 (1975-02-01), Wemmers
patent: 3969118 (1976-07-01), Stahlhofen et al.
patent: 3977884 (1976-08-01), Gulla et al.
patent: 4101323 (1978-07-01), Buhr et al.
patent: 4247611 (1981-01-01), Sander et al.
patent: 4248957 (1981-02-01), Sander et al.
patent: 4250247 (1981-02-01), Sander et al.
patent: 4266001 (1981-05-01), Buhr et al.
patent: 4311782 (1982-01-01), Buhr et al.
patent: 4411983 (1983-10-01), Washizawa et al.
patent: 4416976 (1983-11-01), Schell
patent: 4457999 (1984-07-01), Stahlhofer
patent: 4487823 (1984-12-01), Lehmann et al.
patent: 4506003 (1985-03-01), Ruckert et al.
patent: 4510227 (1985-04-01), Mohr et al.
patent: 4524121 (1985-06-01), Gleim et al.
patent: 4550069 (1985-10-01), Pampalone
patent: 4552908 (1985-11-01), Nicks
patent: 4600683 (1986-07-01), Greco et al.
patent: 4678737 (1987-07-01), Schneller et al.
V. K. Rowe et al., "Toxicology of Mono-, Di-, and Tri-Propylene Glycol Methyl Ethers", Chemical Abstracts, Band 48, Nr. 22, 25, 13951f, Nov. 1954.
The Toxicology of Ethylene Glycol Monoalkyl Ethers and Its Relevance to Man, Technical Report No. 4-European Chemical Industry, 7/1982.

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