Positive-working radiation-sensitive coating solution and positi

Details Positive-working radiation-sensitive coating solution and positi Positive-working radiation-sensitive coating solution and positi

1988-06-10

1989-08-01

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430166, 430169, 430189, 430192, 430270, 430271, 430275, 430277, 430278, 430279, 430935, G03C 160, G03C 174

Patent

active

048533149

ABSTRACT:
A positive-working radiation-sensitive coating solution is disclosed which contains a radiation-sensitive compound, e.g., a 1,2-naphthoquinone diazide, or a radiation-sensitive combination of compounds, e.g., a compound with at least one C-O-C bond which can be split by acid and a compound which upon radiation forms a strong acid, and at least one organic solvent which comprises a mono-C.sub.1 to C.sub.4 -alkyl ether of 1,2-propanediol. The coating solution is less toxic and results in a better layer leveling than known positive-working photoresist solutions.

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patent: 4764450 (1988-08-01), Ruckert et al.

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