Positive-working quinonediazide sulfonic acid ester resist compo

Details Positive-working quinonediazide sulfonic acid ester resist compo Positive-working quinonediazide sulfonic acid ester resist compo

1997-10-24

1998-12-15

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, G03F 7023, G03C 161

Patent

active

058494570

ABSTRACT:
A positive-working resist composition comprising (A) a quinonediazide compound, (B) an alkali-soluble resin, and (C) a solvent system comprising 2-heptanone, ethyl lactate and .gamma.-butylactone in which the quinonediazide compound exhibits a very high solubility and which characteristics such as sensitivity, profile and coatability are excellent.

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