Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1995-06-05
1996-05-21
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, G03F 7023, G03C 161
Patent
active
055188605
ABSTRACT:
A positive-working photoresist composition comprising a cresol novolac resin as the film-forming agent and a quinonediazido group-containing compound as the photosensitizing agent is admixed with a limited amount of a hydroxyalkyl-substituted pyridine compound so that great improvements can be obtained in the adhesive bonding of the resist layer to the substrate surface and in the stability of the composition by storage still without the problem due to the sublimed material from the resist layer during the patterning process.
REFERENCES:
patent: 3622334 (1971-11-01), Matawan et al.
Kato Tetsuya
Kohara Hidekatsu
Koshiyama Jun
Nakayama Toshimasa
Niikura Satoshi
Bowers Jr. Charles L.
Tokyo Ohka Kogyo Co. Ltd.
Young Christopher G.
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