Positive-working quinone diazide photoresist composition contain

Details Positive-working quinone diazide photoresist composition contain Positive-working quinone diazide photoresist composition contain

1989-11-17

1991-08-27

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430193, 430326, G03C 152, G03C 500

Patent

active

050432435

ABSTRACT:
A positive type photoresist composition comprising at least one alkali-soluble resin, at least one quinone diazide compound and a compound of the general formula (I) ##STR1## wherein R.sub.1 and R.sub.2 represents alkyl groups having 1 to 8 carbon atoms or a cycloalkyl group having 1 to 8 carbon atoms, R.sub.3 represents hydrogen, an alkyl group having 1 to 4 carbon atoms or halogen, R.sub.4 represents hydrogen or a cyano group and R.sub.5 represents a cyano group or a carboxyl group.

REFERENCES:
patent: 4349619 (1982-09-01), Kamoshida et al.
patent: 4575480 (1986-03-01), Kotani et al.
patent: 4626492 (1986-12-01), Eilbeck
patent: 4927732 (1990-05-01), Merrem et al.

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