Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1993-08-24
1994-07-26
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 430192, 430272, G03F 709, G03F 7023, G03C 161
Patent
active
053326474
ABSTRACT:
A positive-working photosensitive resin composition useful as a photoresist material in the fine patterning work for the manufacture of semiconductor devices is proposed. The composition is excellent in the storage stability and capable of giving a patterned resist layer having good film thickness retention, cross sectional profile of line patterns, resolution and heat resistance. The composition comprises, in addition to a conventional alkali-soluble novolac resin as a film-forming agent and a quinone diazide group containing compound as a photosensitizing agent, a specific isocyanurate compound substituted at each nitrogen atom with a hydroxy- and ter-butyl-substituted benzyl group.
REFERENCES:
patent: 3075979 (1963-01-01), Tazuma et al.
patent: 3531483 (1970-09-01), Gilles
patent: 3637582 (1972-01-01), Gilles
patent: 3702837 (1972-11-01), Gilles
patent: 4377631 (1983-03-01), Toukhy et al.
patent: 4889789 (1989-12-01), Stahlhofen
Kohara Hidekatsu
Nakayama Toshimasa
Niikura Satoshi
Ohno Hayato
Tokutake Nobuo
Bowers Jr. Charles L.
Burke Henry T.
Tokyo Ohka Kogyo Co. Ltd.
Young Christopher G.
LandOfFree
Positive-working quinone diazide composition containing N,N',N"- does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Positive-working quinone diazide composition containing N,N',N"-, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive-working quinone diazide composition containing N,N',N"- will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1052429