Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-07-29
1995-03-28
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430193, 534557, G03F 7023
Patent
active
054016053
ABSTRACT:
Proposed is a positive-working photosensitive resin composition suitable as a photoresist in the photolithographic patterning work for the manufacture of, for example, semiconductor devices having excellent storage stability and capable of giving a patterned resist layer having excellent contrast of the images, orthogonality of the cross sectional profile of line patterns and heat resistance along with a satisfactorily high photosensitivity and large focusing latitude. The composition comprises, in admixture with an alkali-soluble novolac resin as a film-forming agent, a photosensitizing agent which is an esterification product of a specific tris(hydroxyphenyl) methane compound of which two of the hydroxyphenyl groups each have a cyclohexyl group bonded thereto at a specified position with at least one naphthoquinone-1,2-diazide sulfonyl group as the esterifying group.
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Print out of Registry No. 48230-10-0 Phenol Compound Having Molecular Formula C.sub.31 H.sub.36 O.sub.3.
Japanese Patent Publication 37-18015.
Japanese Patent Publication 62-28457.
Doi Kousuke
Hosoda Hiroshi
Kohara Hidekatsu
Nakayama Toshimasa
Takahashi Kouichi
Bowers Jr. Charles L.
Burke Henry T.
Tokyo Ohka Kogyo Co. Ltd.
Young Christopher G.
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