Positive-working photosensitive mixture and photolithographic co

Details Positive-working photosensitive mixture and photolithographic co Positive-working photosensitive mixture and photolithographic co

1988-08-26

1990-05-29

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430173, 430175, 430182, 430192, 430193, 430165, 430302, 430326, G03C 160, G03C 158, G03C 154

Patent

active

049295349

ABSTRACT:
A positive-working photosensitive mixture containing an o-quinone diazide and a binder is disclosed wherein the mixture contains a compound which is able to form an azo coupling with the o-quinone diazide. A copying material produced with the photosensitive mixture has a high photosensitivity and an exceptional developer resistance. The photosensitive mixture is used in reproduction technique, and also in the field of resists.

REFERENCES:
patent: 2774669 (1956-12-01), Marron et al.
patent: 2974042 (1961-03-01), Sus et al.
patent: 3086861 (1963-04-01), Woitach et al.
patent: 3106465 (1963-10-01), Neugebauer et al.
patent: 3149972 (1964-09-01), Herrick et al.
patent: 3180733 (1965-04-01), Neugebauer et al.
patent: 3615537 (1971-10-01), Giesen et al.
patent: 3634082 (1972-01-01), Christensen
patent: 3635709 (1972-01-01), Kobayashi
patent: 3640992 (1972-02-01), Sus et al.
patent: 3778274 (1973-12-01), Inoue et al.
patent: 3869292 (1975-03-01), Peters
patent: 3890152 (1975-06-01), Ruckert et al.
patent: 3929488 (1975-12-01), Smith
patent: 4266000 (1981-05-01), Stahlhofen et al.
patent: 4266001 (1981-05-01), Buhr et al.
patent: 4275139 (1981-06-01), Stahlhofen
patent: 4446218 (1984-05-01), Dhillon
patent: 4506003 (1985-03-01), Ruckert et al.
patent: 4594306 (1986-06-01), Stahlhofen et al.
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4743524 (1988-05-01), Muller et al.
patent: 4797346 (1989-01-01), Yamamoto et al.
V. V. Ershov et al.; Quinone Diazides; 1981; pp. 113-197 Chapter 5, Reactions Of Quinoediazide Without Elimination Of Nitrogen.
M. S. Dinaburg; Photosensitive Diazo Compounds And Their Uses; 1967, pp. 96-117; "The Focal Press".
Jaromir Kosar; Light-Sensitive Systems; 1965; pp. 194-214 Chemistry and Application of Nonsilver Halide Photographic Process; and pp. 321 and 330; John Wiley & Sons, Inc.

Affiliated with

Also associated with

Rating

Positive-working photosensitive mixture and photolithographic co does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive-working photosensitive mixture and photolithographic co, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive-working photosensitive mixture and photolithographic co will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-520383