Positive-working photosensitive electrostatic master

Details Positive-working photosensitive electrostatic master Positive-working photosensitive electrostatic master

1990-04-10

1992-06-09

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 75, 430 56, 430270, G03G 500

Patent

active

051206293

ABSTRACT:
High resolution photosensitive electrostatic master which forms conductive exposed image areas upon imagewise exposure comprising an electrically conductive substrate bearing a photosensitive layer consisting essentially of at least one acid labile compound which decomposes to form acid, and a photoinitiator or photoinitiating system which upon exposure generates a catalytic amount of a strong acid. A xeroprinting process from producing positive images in said photosensitive layer of the master is also disclosed. The master is useful in the graphic arts field. e.g., making color proofs, preparation of printing circuit boards, resists, solder masks, etc.

REFERENCES:
patent: 3408186 (1968-10-01), Nammino
patent: 3600169 (1971-08-01), Lawton
patent: 4111692 (1978-09-01), Etoh et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4552833 (1985-11-01), Ito et al.
patent: 4661429 (1987-04-01), Molaire et al.
patent: 4732831 (1988-03-01), Riesenfeld et al.
patent: 4837124 (1989-06-01), Wu et al.
patent: 4945020 (1990-07-01), Kempf et al.
patent: 4985332 (1991-01-01), Anderson et al.
patent: 4996136 (1991-02-01), Houlihan et al.

Affiliated with

Also associated with

Rating

Positive-working photosensitive electrostatic master does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive-working photosensitive electrostatic master, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive-working photosensitive electrostatic master will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1803966