Positive working photosensitive compositions

Details Positive working photosensitive compositions Positive working photosensitive compositions

1995-05-24

1997-03-11

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430192, 534557, G03F 7023

Patent

active

056099835

ABSTRACT:
There is provided a positive working photosensitive composition suitable for photosensitive lithographic printing plate or photoresist for fine processing, which comprises a quinonediazide ester compound having the structure characterized by containing in the same molecule both quinonediazide structure and N-sulfonylamide [--C(.dbd.O)--NHSO.sub.2 --] or sulfonamide [--NHSO.sub.2 --] structure which are positioned independently of each other.

REFERENCES:
patent: 2766118 (1956-10-01), Sus et al.
patent: 2975053 (1961-03-01), Schmidt et al.
patent: 3902906 (1975-09-01), Iwama et al.
patent: 5223373 (1993-06-01), Lin et al.

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