Positive-working photosensitive composition with o-quinone diazi

Details Positive-working photosensitive composition with o-quinone diazi Positive-working photosensitive composition with o-quinone diazi

1983-01-07

1985-08-20

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430190, 430191, 430302, 430326, 430165, G03C 160

Patent

active

045364656

ABSTRACT:
A positive-working photosensitive composition comprising (a) an o-quinonediazide compound and (b) a condensed resin containing a condensation unit composed of an aromatic compound having a carboxylic group and a phenolic ahydroxyl group, and an aldehyde or ketone is disclosed. Said condensation unit has the following formula (I): ##STR1## wherein R.sub.1 is a hydrogen atom, a hydroxyl group, an acyloxy group, an alkyl group, an alkoxy group or a halogen atom, which may be the same or different when n is 2; R.sub.2 and R.sub.3 are each a hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, a phenyl group or a substituted phenyl group, which may be the same or different; and n is 1 or 2.

REFERENCES:
patent: 3647443 (1972-03-01), Rauner et al.
patent: 3802885 (1974-04-01), Lawson et al.
patent: 4123279 (1978-10-01), Kobayashi
patent: 4174222 (1979-11-01), Komine et al.
patent: 4306011 (1981-12-01), Uehara et al.
patent: 4460674 (1982-01-01), Uehara et al.

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