Positive-working photosensitive composition containing a dye and

Details Positive-working photosensitive composition containing a dye and Positive-working photosensitive composition containing a dye and

1988-10-20

1990-05-22

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430196, 430197, 430270, 430311, G03C 160, G03C 1495

Patent

active

049277324

ABSTRACT:
A positive-working photosensitive composition is disclosed that comprises a photosensitive compound which is either of the o-quinone diazide type or comprises a photolytic acid donor in combination with a compound containing a C--O--C group, a binder which is soluble or swellable in an aqueous-alkaline solution and a dye of the general formula I ##STR1## The photosensitive composition of the present invention has a higher photosensitivity than comparable compositions containing other dyes.

REFERENCES:
patent: 4349619 (1982-09-01), Kamoshida et al.
patent: 4575480 (1986-03-01), Kotani et al.
patent: 4626492 (1986-12-01), Eilbeck
patent: 4762767 (1988-08-01), Haas et al.
Japan Abstract A89 E14 U11 P83 (5/12/86)G03c-01 86-159626/25 J61093-445-A.
Japan Abstract A89 E21 P83 (5/16/86) C09B-29/08 G03c-01 86-165777/26 J61098-344-A.
Japan Abstract A89E13U11P83 (5/27/86)G03c-01 86-174465/27 J61109-048-A.
Japan Abstract A89 E19 U11 P83 P84 (5/27/86)C08f-02/48 C08K-05/16 G03c-01/71 G03f-07 86-174466/27 J61109-049-A.
A. R. Neureuther et al.; "Photoresist Modeling and Device Fabrication Applications"; Proceedings of Symposium on Optical and Acoustical Micro-Electronics; Polytechnic Institute of New York; 1974; pp. 233-249.
H. L. Stover et al.; "Submicron Optical Lithography: I-line Lens and Photoresist Technology"; SPIE vol. 470 Optical Microlithography III: Technology for the Next Decade; 1984; pp. 22-23.
I. I. Bol; "High-Resolution Optical Lithography Using Dyed Single-Layer Resist"; Proceedings Kodak Microelectronics Seminar; 1984; pp. 19-22.
A. V. Brown et al.; "Optimization of Resist Optical Density for High Resolution Lithography on Reflective Surfaces"; SPIE vol. 539 Advances in Resist Technology and Processing II; 1985; pp. 259-266.
M. P. C. Watts et al.; "The Reduction of Reflective Notches Using Dyed Resist"; Proceedings of 7th International Technical Conference on Photopolymers; Oct. 1985; pp. 285-296.
T. R. Pampalone et al.; "Improving Linewidth Control over Reflective Surfaces Using Heavily Dyed Resists"; Journal of the Electrochemical Society, vol. 133, No. 1; Jan. 1986; pp. 192-196.

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