Positive-working photosensitive composition and process for imag

Details Positive-working photosensitive composition and process for imag Positive-working photosensitive composition and process for imag

1995-12-08

1999-09-28

Nuzzolillo, Maria

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430193, 4302701, 4302711, G03C 152

Patent

active

059586460

ABSTRACT:
Disclosed are (i) a positive-working photosensitive composition containing (a) a polymer having at least 60 mol % structural units represented by formula (1): ##STR1## wherein A represents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 4 carbon atoms; X represents --CO-- or --SO.sub.2 --; Y represents --CO--R.sub.1 or --SO.sub.2 --R.sub.1, where R.sub.1 represents an alkyl group, a substituted alkyl group wherein the substituent on the substituted alkyl group is a halogen atom, an aryl group, an amido group, an alkoxy group or an alkoxycarbonyl group, an unsubstituted aromatic group, or a substituted aromatic group wherein the substituent on the substituted aromatic group is a halogen atom, an alkyl group, an alkoxy group having 1 to 10 carbon atoms, an amido group or an aryl group, provided that at least one of X and Y contains --SO.sub.2 --and (b) a o-naphthoquinone diazide, and (ii) a process for image formation which comprises image-wise exposing to light a photosensitive material having a photosensitive layer comprising the positive-working photosensitive composition and then developing the resulting photosensitive material with an aqueous alkali solution having a pH of 12.5 or below.

REFERENCES:
patent: 3634078 (1972-01-01), Uhlig
patent: 3964908 (1976-06-01), Bargon et al.
patent: 4578444 (1986-03-01), Rossi et al.
patent: 4684599 (1987-08-01), DoMinh et al.
patent: 4857435 (1989-08-01), Hopf et al.
patent: 5134054 (1992-07-01), Iwasawa et al.
patent: 5380612 (1995-01-01), Kojima et al.

Affiliated with

Also associated with

Rating

Positive-working photosensitive composition and process for imag does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive-working photosensitive composition and process for imag, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive-working photosensitive composition and process for imag will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-701629