Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-04-29
1993-06-29
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430191, 430192, 430193, 430326, 534557, 525459, G03F 7023, G03F 732, C08F28304
Patent
active
052233731
ABSTRACT:
Disclosed is a photosensitive quinone diazide compound for the preparation of a two component positive working photosensitive electrodeposition composition. As the photosensitive group is grafted on a polyurethane, the photosensitive compound thus synthesized has good flexibility and good compatability with acrylic resin. The electrodeposition composition also has good adhesion to the metal base plate when it is coated thereon by electrodeposition means.
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Lin Hsien-Kuang
Shieh Jim-Chyuan
Bowers Jr. Charles L.
Chu John S.
Industrial Technology Research Institute
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