Positive-working photoresist employing a selected mixture of eth

Details Positive-working photoresist employing a selected mixture of eth Positive-working photoresist employing a selected mixture of eth

1988-11-10

1990-10-23

Bowers, Jr, Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430193, 430270, 430326, G03C 160, G03F 7022

Patent

active

049651676

ABSTRACT:
A light-sensitive composition comprising an admixture of:

REFERENCES:
patent: 4550069 (1985-10-01), Pompalone
patent: 4692398 (1989-09-01), Durham
patent: 4845008 (1989-07-01), Nishioka et al.
patent: 4871645 (1989-10-01), Uenishi
patent: 4883739 (1989-11-01), Sakaguchi et al.
Salamy et al., "Solvent Effects In Positive Photoresists", Electrochemical Society Meeting, Hollywood, Fla., Oct. 19, 1989.
Ethyl 3-Ethoxypropionate Material Safety Data Sheet (Kodak Chemical Products).
Pieter Burggraaf, "Positive Photoresists: 1988 Trends", Semiconductor International, Apr. 1988, pp. 128-133.

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