Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-08-21
1994-01-25
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430190, 430193, G03F 7023
Patent
active
052815080
ABSTRACT:
A positive-working photoresist composition suitable for fine patterning in the manufacture of semiconductor devices, e.g., VLSIs, with high fidelity is proposed. The composition comprises 100 parts by weight of a cresol novolac resin and 25-60 parts by weight of a naphthoquinone diazide sulfonic acid ester as the photosensitive component while the cresol novolac resin component is prepared from a mixture of cresol isomers composed of 35-43% of m-cresol and 65-57% of p-cresol with substantial absence of o-cresol or composed of 35-43% of m-cresol, 65-57% of p-cresol and 1% or less of o-cresol.
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patent: 4587196 (1986-05-01), Toukhy
patent: 4731319 (1988-03-01), Kohara et al.
Pampalone, T. R., Solid State Tech., Jun. 1984, pp. 115-120.
Arai Yoshiaki
Asaumi Shingo
Kohara Hidekatsu
Miyabe Masanori
Nakane Hisashi
Bowers Jr. Charles L.
Tokyo Ohka Kogyo Co. Ltd.
Young Christopher G.
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