Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1990-12-06
1992-03-31
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430193, 430165, G03F 7023, G03C 161
Patent
active
051007584
ABSTRACT:
A proposal is made for the use of an alkyl pyruvate or a solvent mixture mainly composed thereof as a solvent in a positive-working photoresist composition comprising an alkali-soluble novolac resin as the film-forming ingredient and a quinone diazide group-containing compound as the photosensitive ingredient. By virtue of the use of the unique solvent, the photoresist composition is advantageous in the outstandingly high stability with little moisture absorption from ambience not to cause precipitation of solid matters in addition to the quite satisfactory properties in other respects as a photoresist composition.
REFERENCES:
patent: 4373017 (1983-02-01), Masukawa et al.
patent: 4707430 (1987-11-01), Ozawa et al.
patent: 4939056 (1990-07-01), Hotomi et al.
patent: 4983492 (1991-01-01), Trefonas, III et al.
"Hackh's Chemical Dictionary", fourth edition, 1969, pp. 253 and 426.
Kohara Hidekatsu
Nakayama Toshimasa
Tanaka Hatsuyuki
Bowers Jr. Charles L.
Tokyo Ohka Kobyo Co., Ltd.
Young Christopher G.
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