Positive-working photoresist composition and method for forming

Details Positive-working photoresist composition and method for forming Positive-working photoresist composition and method for forming

1985-05-01

1986-05-20

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Producing cathode-ray tube or element thereof

With light-absorbing matrix on faceplate

430 23, 430 28, 430327, 430330, 430540, G03C 500

Patent

active

045901384

ABSTRACT:
A positive-working photoresist composition is described comprising a solution of polyvinyl alcohol, an inorganic ferric salt, ammonium trioxalatoferrate and a diol such as 1,4-butanediol. There is also described the addition of a finely divided black pigment to such a composition and the use of such a black pigmented composition for the formation of a light-absorbing matrix in a color CRT screen structure.

REFERENCES:
patent: 3615462 (1971-10-01), Szegho et al.
patent: 3620735 (1971-11-01), Ulano
patent: 3726678 (1973-04-01), Robinder
patent: 3804621 (1974-04-01), McIntosh
patent: 4245019 (1981-01-01), Bergamo et al.
patent: 4339528 (1982-07-01), Goldman
patent: 4505999 (1985-03-01), Bergamo et al.

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