Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-12-22
1996-09-10
Chu, John S. Y.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430191, 430193, 534557, G03F 7023
Patent
active
055544819
ABSTRACT:
A positive working photoresist composition sensitive to radiation, having high resolving power, high sensitivity, and excellent storage stability, and further forming a pattern capable of accurately reproducing a mask size in a wide range of photomask line width. The present invention has been obtained by a composition containing at least one of a 1,2-napthoquinonediazido-5-sulfonic acid ester of a polyhydroxy compound and a 1,2-napthoquinonediazido-4-sulfonic acid ester of a polyhydroxy compound in combination with at least one alkali-soluble resin.
REFERENCES:
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patent: 4407926 (1983-10-01), Stahlhofen
patent: 5173389 (1992-12-01), Uenishi et al.
patent: 5200293 (1993-04-01), Schulz et al.
patent: 5407779 (1995-04-01), Uetani et al.
JP 6167805 (Derwent Abstract).
JP 2296248 (Derwent Abstract).
Aoai Toshiaki
Kawabe Yasumasa
Satoh Kenichiro
Chu John S. Y.
Fuji Photo Film Co. , Ltd.
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