Positive-working photoresist composition

Details Positive-working photoresist composition Positive-working photoresist composition

1990-04-26

1992-12-22

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430190, 430193, 430326, 534557, G03F 7023, G03F 732

Patent

active

051733897

ABSTRACT:
A positive-working photoresist composition is disclosed, which comprises (1) a light-sensitive material obtained by reacting a polyhydroxy compound containing at least one group represented by the following general formula (I) per molecule with at least one of 1,2-naphthoquinonediazido-5-sulfonyl chloride and 1,2-naphthoquinonediazido-4-sulfonyl chloride, and (2) an alkali-soluble novolak resin: ##STR1## wherein R.sub.1 and R.sub.2 each represents a hydrogen atom or a C.sub.1 -C.sub.4 straight or branched alkyl or alkoxy group, provided that R.sub.1 and R.sub.2 do not represent hydrogen atoms at the same time; and X represents a divalent organic group.

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patent: 4883739 (1989-11-01), Sakaguchi et al.
patent: 5019478 (1991-05-01), Toukhy et al.

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