Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1996-07-09
1998-01-20
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 430193, G03F 7023
Patent
active
057099774
ABSTRACT:
Provided is a positive working photoresist composition which comprises a 1,2-quinonediazide compound and an alkali-soluble resin obtained by condensing a specified phenol compound, formaldehyde and a specified aromatic aldehyde having at least one alkoxy substituent and at least one hydroxy substituent.
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Database WPI, Week 9108, Derwent Publications Ltd., London, GB; AN 91-053474 & JP-A-02 300 751 (Mitsubishi Petroch KK).
Database, WPI Week 8646, Derwent Publications Ltd., London, GB; AN 86-301835 & JP-A-61 223 735 (Japan Synthetic Rubber) Abstract.
Kawabe Yasumasa
Tan Shiro
Chu John S.
Fuji Photo Film Co. , Ltd.
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