Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1996-09-05
1997-07-29
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430191, 430193, 528149, 528155, G03F 7023
Patent
active
056520816
ABSTRACT:
Provided is a positive working photoresist composition which comprises an alkali-soluble resin and a 1,2-quinonediazide compound, with the resin being a novolak resin obtained by the condensation reaction of monomers comprising specified phenol compounds with formaldehyde.
REFERENCES:
patent: 4564575 (1986-01-01), Perreault et al.
patent: 4642282 (1987-02-01), Stahlhofen
patent: 4906549 (1990-03-01), Asaumi et al.
patent: 5001040 (1991-03-01), Blakeney et al.
patent: 5019479 (1991-05-01), Oka et al.
patent: 5087548 (1992-02-01), Hosaka et al.
patent: 5110706 (1992-05-01), Yumoto et al.
Kawabe Yasumasa
Sakaguchi Shinji
Tan Shiro
Chu John S.
Fuji Photo Film Co. , Ltd.
LandOfFree
Positive working photoresist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Positive working photoresist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive working photoresist composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-632468