Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-12-16
1997-03-11
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 430193, 534557, G03F 7023
Patent
active
056099827
ABSTRACT:
The present invention provides a positive-working photoresist composition comprising an alkali-soluble resin and a 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic ester of a specific water-insoluble alkali-soluble low molecular compound, wherein the high-performance liquid chromatography of the ester with an ultraviolet ray at 254 nm shows that the patterns corresponding to the diester components and complete ester component of the ester each fall within the specific range and a positive-working photoresist composition comprising a water-insoluble alkali-soluble resin, a water-insoluble alkali-soluble low molecular compound, and an ionization-sensitive radioactive compound which comprises a mixture of a naphthoquinone-diazidesulfonic diester of a water-insoluble alkali-soluble low molecular compound having three phenolic hydroxyl groups as an ionization-sensitive radioactive compound (A) and a naphthoquinonediazidesulfonic diester of a water-insoluble alkali-soluble low molecular compound having four phenolic hydroxyl groups as an ionization-sensitive radioactive compound (B) in an amount of 30% or more by weight based on the total amount of the ionization-sensitive radioactive compound.
REFERENCES:
patent: 5059507 (1991-10-01), Uetani et al.
patent: 5143815 (1992-09-01), Stahlhofen
patent: 5166033 (1992-11-01), Oie et al.
patent: 5173389 (1992-12-01), Uenishi et al.
patent: 5306596 (1994-04-01), Oie et al.
patent: 5378586 (1995-01-01), Uetani et al.
patent: 5407779 (1995-04-01), Uetani et al.
patent: 5554481 (1996-09-01), Kawabe et al.
Aoai Toshiaki
Kawabe Yasumasa
Sakaguchi Shinji
Sato Kenichiro
Chu John S.
Fuji Photo Film Co. , Ltd.
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