Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1996-09-19
1999-09-07
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430192, 430193, G03F 7023
Patent
active
059485876
ABSTRACT:
Provided is a positive working photoresist composition comprising (A) an alkali-soluble novolak resin obtained by condensation reaction of a mixture of phenols, which are constituted of specified proportions of m-cresol and two kinds of specific phenols, with an aldehyde and having a Mw/Mn ratio of from 1.5 to 4.0 (wherein Mw stands for a weight-average molecular weight, and Mn stands for a number-average molecular weight); (B) a 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic acid ester as a photosensitive material; and (C) a low molecular weight compound having from 12 to 50 carbon atoms per molecule and from 2 to 8 phenolic hydroxy groups per molecule.
REFERENCES:
patent: 4812551 (1989-03-01), Oi et al.
patent: 4906549 (1990-03-01), Asaumi et al.
patent: 4988601 (1991-01-01), Ushirogouchi et al.
patent: 5019479 (1991-05-01), Oka et al.
patent: 5110706 (1992-05-01), Yumoto et al.
patent: 5340686 (1994-08-01), Sakaguchi et al.
patent: 5376497 (1994-12-01), Kawata et al.
patent: 5403696 (1995-04-01), Hioki et al.
patent: 5407780 (1995-04-01), Hioki et al.
patent: 5447825 (1995-09-01), Nishi et al.
patent: 5554481 (1996-09-01), Kawabe et al.
Kawabe Yasumasa
Tan Shiro
Chu John S.
Fuji Photo Film Co. , Ltd.
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