Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1990-02-28
1992-07-14
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430167, 430192, 430193, 430196, 430197, 430512, G03F 7012, G03F 7023, G03C 161
Patent
active
051302241
ABSTRACT:
A positive-working photoresist composition is disclosed comprising an alkali-soluble resin and a 1,2-naphthoquinonediazido group-containing compound, and further contains at least one light absorber selected from the group consisting of the azo compounds represented by the following formulae (I), (II), (III), (IV), (V) and (VI) in a proportion of from about 0.1 to about 10% by weight based on the total solid content of the photoresist composition, and is useful for forming a fine pattern of excellent quality even on a substrate with unevenness or high reflectivity: ##STR1## wherein R.sub.1 represents a hydrogen atom or a lower alkyl group; and X represents a sulfur atom or an oxygen atom; ##STR2## wherein R.sub.2 represents a hydroxyl group or a di(lower alkyl)amino group; R.sub.3 and R.sub.4 each represents a hydrogen atom or a carboxyl group, provided that at least one of R.sub.3 and R.sub.4 represents a carboxyl group; and R.sub.5 represents a hydrogen atom, a hydroxyl group or a nitro group; ##STR3## wherein R.sub.6 and R.sub.7 each represents a hydrogen atom, a lower alkyl group or a nitro group; R.sub.8 represents a hydrogen atom, a hydroxyl group or an amino group; R.sub.9 and R.sub.10 each represents a hydrogen atom, an amino group, a lower alkyl group, a nitro group or an acylamino group; ##STR4## wherein R.sub.11 and R.sub.12 each represents a lower alkyl group or a nitro group, provided that at least one of R.sub.11 and R.sub.12 represents a nitro group; ##STR5## wherein R.sub.13 and R.sub.14 each represents a hydrogen atom, a hydroxyl group, a nitro group or a lower alkyl group, provided that at least one of R.sub.13 and R.sub.14 represents a hydroxyl group; and ##STR6## wherein R.sub.15 and R.sub.16 each represents a hydrogen atom or a hydroxyl group, provided that at least one of R.sub.15 and R.sub.16 represents a hydroxyl group.
REFERENCES:
patent: 3666473 (1972-05-01), Colom et al.
patent: 4626492 (1986-12-01), Eilbeck
patent: 4828960 (1989-05-01), Hertog
patent: 4882260 (1989-11-01), Kohara et al.
Kawabe Yasumasa
Kokubo Tadayoshi
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
Young Christopher G.
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