Positive-working o-quinone diazide photoresist composition

Details Positive-working o-quinone diazide photoresist composition Positive-working o-quinone diazide photoresist composition

1988-01-20

1989-09-05

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, 534557, G03C 160, G03C 154

Patent

active

048638285

ABSTRACT:
A positive-working photoresist composition is disclosed, which comprises a light-sensitive substance of 1,2-naphthoquinonediazide-4- and/or -5-sulfonate of 2,3,4,3',4',5'-hexahydroxybenzophenone and an alkali-soluble novolak resin dissolved in ethyl lactate or methyl lactate.

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patent: 3130047 (1964-04-01), Uhlig et al.
patent: 4421841 (1983-12-01), Shimizu et al.
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patent: 4594306 (1986-06-01), Stahlhofen et al.
patent: 4626492 (1986-12-01), Eilbeck
English Translation of Japanese Publication No. 60-121,445, Published 12/6/1983, (Hosaka et al.).

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