Positive-working naphthoquinone diazide sulfonic acid ester phot

Details Positive-working naphthoquinone diazide sulfonic acid ester phot Positive-working naphthoquinone diazide sulfonic acid ester phot

1994-11-29

1995-12-26

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, G03F 7023

Patent

active

054786924

ABSTRACT:
Proposed is a novel positive-working photoresist composition suitable for use in the fine patterning works in the manufacture of electronic devices and capable of exhibiting excellent performance with high resolution, high sensitivity, wide range of focusing depth, large exposure dose latitude and other characteristics. The photoresist composition is formulated, in addition to the basic ingredients of an alkali-soluble novolac resin as a film-forming agent and photosensitive ingredient such as an ester of naphthoquinone-1,2-diazide sulfonic acid and a polyhydroxy compound, with a limited amount of 4,4'-bis(dialkylamino) benzophenone, e.g., 4,4'-bis(diethylamino) benzophenone, preferably, in combination with a polyhydroxy compound such as 4,6-bis[1-methyl-1-(4-hydroxyphenyl)ethyl]-1,3-dihydroxy phenol.

REFERENCES:
patent: 4707430 (1987-11-01), Ozawa et al.
patent: 4738915 (1988-04-01), Komine et al.
patent: 5238775 (1993-08-01), Kajita et al.

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