Positive-working light-sensitive composition containing diazoniu

Details Positive-working light-sensitive composition containing diazoniu Positive-working light-sensitive composition containing diazoniu

1992-12-09

1994-12-06

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430163, G03F 7021

Patent

active

053709659

ABSTRACT:
A positive-working light-sensitive composition comprises a diazonium salt represented by the following general formula (I) and an alkali-soluble polymer: ##STR1## wherein R.sup.1 represents a substituted or unsubstituted alkyl group having 3 to 18 carbon atoms; R.sup.2 represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted phenoxy group or a halogen atom; A represents an organic group; X.sup.-- represents a counterion or an anion; n is an integer ranging from 1 to 4 and m is an integer ranging from 1 to 3, provided that the sum of n and m is equal to 4. The positive-working light-sensitive composition has high sensitivity and can ensure the formation of clear images.

REFERENCES:
patent: 3219447 (1965-11-01), Neugebauer et al.
patent: 4659644 (1987-04-01), Hoshina et al.
patent: 4661432 (1987-04-01), Lutz et al.

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