Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-01-31
1995-03-28
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430168, 430169, 430191, 430192, 430193, G03F 7023
Patent
active
054016045
ABSTRACT:
A positive-type photosensitive resin composition containing a resin which results from reactions between a specific polyepoxide compound, a carboxylic acid compound having a specific phenolic hydroxyl group, a carboxylic acid compound having no specific phenolic hydroxyl group, and 1,2-quinone diazide sulfonyl halide. The resin composition has high exposure sensitivity, is capable of inhibiting swell or dissolution of unexposed areas during the stage of development, and yet retains other favorable properties. The resin composition has also attained short developing time.
REFERENCES:
patent: 4999274 (1991-03-01), Seio et al.
patent: 5055374 (1991-10-01), Seio et al.
Kawamura Kazuyuki
Otsuka Chikayuki
Sakurai Kiyomi
Seio Mamoru
Bowers Jr. Charles L.
Nippon Paint Co. Ltd.
Young Christopher G.
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