Positive type photoresist composition comprising polyaromatic hy

Details Positive type photoresist composition comprising polyaromatic hy Positive type photoresist composition comprising polyaromatic hy

1992-04-24

1994-03-01

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430193, 430326, 534556, 534557, G03F 7023, G03F 7031

Patent

active

052906582

ABSTRACT:
A positive photoresist composition is provided, which comprises an alkali-soluble novolak resin and at least one light-sensitive material represented by formula (III), ##STR1## wherein R.sub.27 and R.sub.28 may be the same or different and which represents --OH, ##STR2## R.sub.29 and R.sub.33 may be the same or different and each represents --H, --OH, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aryloxy group, a substituted or unsubstituted aralkyloxy group, a substituted or unsubstituted acyl group, a substituted or unsubstituted acyloxy group, a halogen, a nitro group, a cyano group, ##STR3## R.sub.34 to R.sub.39 may be the same or different and each represents --H, --OH, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted acyloxy group, ##STR4## with the proviso that the number of ##STR5## substituent groups is at least 2 and not more than 7, and at least four of R.sub.34 to R.sub.39 is a substituent selected from the group consisting of an alkyl group, an alkoxy group, an aryl group, an aralkyl group, and an acyloxy group.

REFERENCES:
patent: 4101323 (1978-07-01), Buhr et al.
patent: 4731319 (1988-03-01), Kohara et al.
patent: 4906549 (1990-03-01), Asaumi et al.
patent: 5153096 (1992-10-01), Uenishi et al.
patent: 5238775 (1993-08-01), Kajita et al.
Chemical Abstracts 112: 207951n.
Patent Abstracts of Japan, vol. 13, No. 478, (P-951)(3826), Oct. 30, 1989 & JP-A-1 189 644 (Fuji Photo Film Co., Ltd.), Jul. 28, 1989.

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