Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1998-12-02
2000-12-05
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430192, 430193, G03F 7023
Patent
active
061564745
ABSTRACT:
To provide a positive type photoresist composition which is capable of forming a resist pattern having an excellent adhesion to a substrate, a positive type photoresist composition comprising a polymer containing a specified amount of a polypropylene oxide group and a polyethylene oxide group is provided.
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patent: 5750310 (1998-05-01), Sato et al.
patent: 5834531 (1998-11-01), Schacht et al.
patent: 5928818 (1999-07-01), Mertesdorf et al.
Awaji Akira
Nakano Sigeki
Ogawa Teruaki
Takahashi Kenta
Chu John S.
Corless Peter F.
Frickey Darryl P.
Shipley Company L.L.C.
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